ATOP Jewellery Rose Gold Multi-arc Vacuum Magnetron Sputtering Coating Machine

 
Vacuum magnetron sputtering coating machine working principle:the so-called "splash", the electrons in
 
an electric field under the action of accelerating the process of flying to the substrate with argon atom
 
collision, ionization out large amounts of argon ions and electrons.The electron flies toward the substrate,
 
the argon ion speeds up the target material under the action of the electric field, sputtering out a large
 
number of target atom, and the neutral target atom (or molecule) is deposited on the substrate to form the
 
film.Secondary electron in accelerating to fly to the substrate by magnetic field in the process of lorentz
 
magnetic force, the influence of confined area near the target surface plasma, the plasma density in the
 
area is very high, secondary electron under the action of magnetic field around the target surface is
 
circular motion, the electron motion path is very long, constantly in the process of movement of the impact
 
ionization out large amounts of argon ion bombardment of target, after many times of collision of the
 
electron energy gradually reduce, cast off the yoke of the magnetic field lines, away from the target
 
material, the final deposition on the substrate.
 

 
1.The Vacuum coating chamber, valves and piping are made of stainless steel vacuum chamber effective
 
diameter from Φ500 mm to Φ2000 mm.
 
 
2. The vacuum system consists of mechanical pump, rotary vane pump, roots pump and a cold well high
 
vacuum oil diffusion pump or molecular pump;
 
 
3. The coating system adopts multiple flat target or cylindrical target, with multiple dc power or medium
 
frequency power supply.
 
 
4. The auxiliary pumping system adopts a low-temperature water vapor trap;
 
 
5. The gas flow meter and flow control (display) control of the pneumatic system are adopted.
 
 
6. The electric control system shall set up circuit overload, water breaking and sound alarm device of the
 
broken air;
 
 
7. Control system (touch screen + PLC), display detailed parameters in real time, fully automatic control of
 
the entire production process, and automatic storage of process parameters.
 
 
8. The equipment is equipped with high power bias system and the ionizing source auxiliary deposition
 
coating;
 
 

 
1. The high energy emitted by sputtering has significantly enhanced the membrane density and adhesion.
 
 
2. The workpiece frame adopts the public rotation structure, which can set the automatic positive and
 
backward rotation, and the product is even good.
 
 
3. Reasonable configuration, quick pumping rate, low noise, low energy consumption.
 
 
4. The film layer deposited by this equipment can meet customer requirements in terms of density,
 
uniformity, purity and hardness.
 
 
5. The touch screen +PLC can achieve full automatic control, automatic/manual switching.