ATOP ABS Plastic Chrome Plating Vacuum Evaporation PVD Coating Equipment

 
 

Basic configuration

 

1. The gas flow meter and flow control (display) control of the pneumatic system are adopted.

 

 

2. The electric control system shall set up circuit overload, water breaking and sound alarm device of the

 

broken air;

 

 

3. Control system (touch screen + PLC), display detailed parameters in real time, fully automatic control of

 

the entire production process, and automatic storage of process parameters.

 

 

4. The equipment is equipped with high power bias system and the ionizing source auxiliary deposition

 

coating;

 

 

5, the coating chamber, valves and piping are made of stainless steel ,vacuum chamber size from Φ500

 

mm to Φ2000 mm.

 

 

6. The vacuum system consists of mechanical pump, rotary vane pump, roots pump and cold well high

 

vacuum oil diffusion pump or molecular pump;

 

 

7. The coating system adopts multiple flat target or cylindrical target, with multiple dc power or medium

 

frequency power supply.

 

 

8. The auxiliary pumping system adopts a low-temperature water vapor trap;

 

 

 

 

1. It equipments cryogenic ion secondary source, some substrate without heating the material, It

can directly do the cold plating film at room temperature, save energy, increase productivity.

2. The maximum of the temperature for tool coating chamber can 600 degrees, In addition to the tool

Coater coating applications require heating device, other applications do not need the device.

3. High deposition rate, High coating speed, It can be widely used to do the decorative coating, functional

coating on a variety of products. So it is a ideal equipment to do the high-grade and best coating for mass

production.

4. Magnetron sputtering principle is based on the theory of the cathode glow discharge, it expend the

cathode surface magnetic field near the work piece surface. Then it improves the sputtered atom

ionization rate. It keeps the magnetron sputtering uniformity, also can improve the surface shining effect.

5. The arc plasma evaporation source is reliable, it can work under 40A current in optimizing the cathode

and the magnetic field structure,. It will happen atomic diffusion between the coating and the material. It

also has the advantages that lon Beam Assisted Deposition.

6. Vacuum pumping system, electric control system and complete vacuum coating system can be

customized according to user requirements.

 

 

 

 

 

 

Working Principle

 

 

Vacuum magnetron sputtering coating machine working principle:the so-called "splash", the electrons in

 

an electric field under the action of accelerating the process of flying to the substrate with argon atom

 

collision, ionization out large amounts of argon ions and electrons.The electron flies toward the substrate,

 

the argon ion speeds up the target material under the action of the electric field, sputtering out a large

 

number of target atom, and the neutral target atom (or molecule) is deposited on the substrate to form the

 

film.Secondary electron in accelerating to fly to the substrate by magnetic field in the process of lorentz

 

magnetic force, the influence of confined area near the target surface plasma, the plasma density in the

 

area is very high, secondary electron under the action of magnetic field around the target surface is

 

circular motion, the electron motion path is very long, constantly in the process of movement of the impact

 

ionization out large amounts of argon ion bombardment of target, after many times of collision of the

 

electron energy gradually reduce, cast off the yoke of the magnetic field lines, away from the target

 

material, the final deposition on the substrate.